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Energy harvesting based on piezoelectric AlN and AlScN thin films deposited by high rate sputtering

机译:基于压电ALN和ALSCN薄膜沉积的能量收集,高速溅射沉积

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Aluminum nitride (AlN) is a piezoelectric material often used as thin film in SAW/BAW devices. Furthermore, there is an increasing interest in its use for energy harvesting applications. Despite it has a relatively low piezoelectric coefficient, it is a suitable choice for energy harvesting applications and due to its low dielectric constant and good mechanical properties. In addition, it is a lead-free material. The films were deposited by reactive pulsed magnetron sputtering using the Double Ring Magnetron DRM 400. This sputter source together with suitable powering and process control allows depositing piezoelectric AlN very homogeneously on 8" substrates with deposition rates of up to 200 nm/min. With the developed technology, film thicknesses of several ten microns are technically and economically feasible. Moreover, by adjusting process parameters accordingly, it is possible to tune properties, like film stress, to application specific requirements. Additionally, it is known that the doping of AlN with Scandium results in a significantly increased piezoelectric coefficient. The influence of process parameters and Sc concentration on film properties were determined by piezometer, pulse echo, SEM, XRD, EDS and nanoindentation measurements. Energy harvesting measurements were done using an electromechanical shaker system for the excitation of defined vibrations and a laservibrometer for determination of the displacement of the samples. The generated power was measured as function of electric load at resonance. An rms power of up to 140μW using AlN films and of 350μW using AlScN films was generated on Si test pieces of 8×80mm~2. Furthermore, energy harvesting measurements using manually bended steel strips of 75×25mm~2 coated with AlScN were carried out as well. When using only a single actuation, energy of up to 8μJ could be measured. By letting the system vibrate freely, the damped vibration at resonance 50Hz resulted in a measured energy of 420μJ.
机译:氮化铝(ALN)是一种通常用作锯/凸刀装置的薄膜的压电材料。此外,对其用于能量收集应用的使用越来越令人兴趣。尽管它具有相对较低的压电系数,但它是能量收集应用的合适选择,并且由于其低介电常数和良好的机械性能。此外,它是一种无铅材料。通过双环磁控硅DRM 400通过反应性脉冲磁控溅射沉积膜。该溅射源与合适的电力和过程控制一起允许在8“底板上非常均匀地沉积压电ALN,其沉积速率高达200nm / min。随着开发的技术,几十微米的膜厚度在技术上和经济上可行。此外,通过调整过程参数相应地调节工艺参数,可以调整薄膜应力,如薄膜应力,以应用特定要求。另外,众所周知,众所周知,Aln的掺杂钪导致压电系数显着增加。通过压阻计,脉冲回波,SEM,XRD,EDS和纳米狭窄测量测定工艺参数和SC浓度对膜性能的影响。使用机电振动器系统进行励磁的能量收集测量定义的振动和拉伸器对样品的位移进行rinate。产生的电力作为谐振处的电负载的功能测量。在8×80mm〜2的Si试验片上产生使用ALN薄膜和350μW高达140μW的RMS功率。此外,还使用手动弯曲的钢带的能量收集测量为75×25mm〜2涂覆有Alscn的钢带。仅使用单个致动时,可以测量高达8μJ的能量。通过使系统自由振动,谐振50Hz的阻尼振动导致测量的420μJ的能量。

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