机译:用于超声和能量收集应用的应力控制压电AlN和AlScN膜的溅射沉积
Fraunhofer Inst. for Electron Beam & Plasma Technol. (FEP), Dresden, Germany;
III-V semiconductors; X-ray diffraction; aluminium compounds; compressive strength; energy harvesting; grain size; internal stresses; piezoelectric thin films; scandium compounds; scanning electron microscopy; semiconductor growth; semiconductor thin films; sputter deposition; tensile strength; wide band gap semiconductors; Alsubx/subScsub1-x/subN; AlN; SEM; XRD; energy harvesting applications; grain sizes; mechanical stress; piezoelectric layers; piezoelectric properties; piezometer measurements; pulse echo; pulse mode; sputter deposition; sputter pressure; stress-controlled piezoelectric films; thermo probe; ultrasonic applications; Acoustics; Grain size; III-V semiconductor materials; Sputtering; Stress; Substrates; Temperature measurement;
机译:压电AlN和AlScN薄膜的磁控溅射及其在能量收集应用中的用途
机译:脉冲直流磁控溅射压电AlN和AlScN薄膜的表面形貌和微观结构
机译:用于振动能量收集的在不锈钢上生长的AlN薄膜的微观结构和压电性能
机译:溅射沉积压电AlN和AlScN膜,用于超声和能量收集应用
机译:金刚石薄膜在电推进中的应用:低能量溅射产率测量和MPD等离子体辅助化学气相沉积。
机译:用柔性压电能量收集微生物喷涂沉积的ZnO纳米棒膜的合成
机译:用于绿色能源应用的UV固化纳米纤维素/ ZnO / AlN聚合物柔性薄膜的合成与压电表征