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Effect of scandium content on structure and piezoelectric properties of AlScN films deposited by reactive pulse magnetron sputtering

机译:钪含量对反应脉冲磁控溅射沉积的Alscn膜结构和压电性能的影响

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摘要

AlxSc1-xN films were deposited by reactive pulse magnetron co-sputtering from aluminum and scandium targets without additional substrate heating at deposition rates between 100 and 150 nm/min. With increasing incorporation of scandium into the hexagonal wurtzite structure, the piezoelectric properties are drastically improved. The piezoelectric charge coefficient d(33) is increased from 8.4 pC/N for AlN up to 23.6 pC/N for AlxSc1-xN with 33% scandium. Between 35 and 43% scandium content a relative broad maximum with high piezoelectric coefficients between 26.9 and 273 pC/N was detected. A further increase of scandium concentration above 50% results in the formation of the cubic and centrosymmetric rock salt structure and therefore the complete loss of piezoelectric properties.
机译:通过从铝和钪靶的反应性脉冲磁控管倒溅射沉积AlxSc1-Xn膜,而无需在沉积速率100至150nm / min之间的沉积速率下的另外的衬底加热。 随着钪掺入六边形紫立岩结构的随着压电性能急剧提高。 压电电荷系数d(33)从8.4 pc / n增加,对于Aln,对于AlxSc1-XN,具有33%的Aln,具有33%的钪。 在35至43%的钪含量之间检测到26.9和273pc / n之间的高压电系数的相对宽的最大值。 进一步增加钪浓度高于50%的结果导致立方体和亚聚对称岩盐结构的形成,从而形成压电性能的完全丧失。

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