首页> 外文会议>Memory Workshop, 2009. IMW '09 >Low Power Operation of Resistive Switching Memory Device Using Novel W/Ge0.4Se0.6/Cu/Al Structure
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Low Power Operation of Resistive Switching Memory Device Using Novel W/Ge0.4Se0.6/Cu/Al Structure

机译:使用新型W / Ge0.4Se0.6 / Cu / Al结构的电阻式开关存储器件的低功耗操作

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Bipolar resistive switching memory device with a low power operation (200 muA/1.3 V) in a W/Ge0.4Se0.6/Cu/Al structure has been investigated. A stronger Cu chain formation can be observed by monitoring both the erase voltage and current. The low resistance state (RLow) decreases with increasing the programming current from InA to 500 muA, which can be useful for multi-level of data storage. This resistive memory device has a large threshold voltage of ~0.5 V, good resistance ratio (RHigh/RLow) of 1.6 times 102, good endurance of >1.5 times 105 cycles, and excellent retention (>11 hours) with a resistance ratio of > 1.3 times 102 at 150degC can be used in future nonvolatile memories.
机译:研究了在W / Ge 0.4 Se 0.6 / Cu / Al结构中具有低功耗操作(200μA/ 1.3 V)的双极电阻式开关存储器件。通过监视擦除电压和电流,可以观察到更强的铜链形成。随着编程电流从InA增加到500μA,低电阻状态(R Low )减小,这对于多级数据存储很有用。该电阻存储器件的阈值电压约为0.5 V,具有较大的电阻比(R High / R Low )是10 2 的1.6倍将来可以使用> 1.5倍10 5 循环的良好耐久性,以及在150°C下的电阻比> 1.3倍10 2 的优异保持时间(> 11小时)。非易失性存储器。

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