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Impact of Temperature Variation on CNTFET Device Characteristics

机译:温度变化对CNTFET器件特性的影响

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In this paper we compare and justify the advantage of CNTFET devices over MOSFET devices in nanometer regime, by varying oxide thickness. Thereafter we have analyzed the effect of temperature in the characteristics of CNTFET devices. After simulation of Stanford nano-model-39 of CNTFET on HSPICE tool we observed that the effect of temperature on threshold voltage of CNTFET is negligibly small. Since there is little variation in threshold voltage so the leakage power due to temperature in scaled down scenario is very less compare to MOSFET devices.
机译:在本文中,通过改变氧化物厚度,我们将CNTFET器件在MOSFET器件上的优势进行比较和证明CNTFET器件的优势。此后我们已经分析了CNTFET器件特性温度的影响。在HSPICE工具上模拟CNTFET的斯坦福纳米模型-39之后,我们观察到温度对CNTFET的阈值电压的影响忽略于小。由于阈值电压几乎没有变化,因此由于缩小方案中的温度导致的泄漏功率非常少于MOSFET设备。

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