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Effect of indium tin oxide (ITO) current spreading layer on the current uniformity of vertical structure GaN-based light-emitting diodes

机译:氧化铟锡(ITO)电流扩散层对垂直结构GaN基发光二极管均匀性的影响

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Compared with conventional GaN based LEDs structure, vertical electrodes structure can improve the current uniformity to some extend. However, due to the presence of N-GaN series resistance, current crowing phenomenon still exist at the electrode edge of vertical structure GaN-based LEDs. The most common solutions to overcome these problems consist in using transparent current spreading contact layer, generally made of indium tin oxide(ITO). In this paper, the effect of indium tin oxide (ITO) layer on the current uniformity and the current distribution are analyzed by theoretical calculation. At last, vertical structure GaN-based LEDs was fabricated and the electrical character was measured. Experiment result exhibits good agreement with the theoretical calculation.
机译:与传统的GaN基LED结构相比,垂直电极结构可以改善对一些延伸的电流均匀性。然而,由于存在N-GaN系列电阻,在基于垂直结构GaN的LED的电极边缘处仍存在电流繁殖现象。克服这些问题的最常见解决方案包括透明电流扩散接触层,通常由氧化铟锡(ITO)制成。本文通过理论计算分析了氧化铟锡(ITO)层对电流均匀性和电流分布的影响。最后,制造了垂直结构GaN的LED,并测量了电气特性。实验结果与理论计算表现出良好的一致性。

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