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Performance-Limiting Defects in GaN

机译:GaN的性能限制缺陷

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The lII-V nitrides and GaN, in particular are emerging new semiconductors for electronic devices, including light -emitting diodes (LED) and laser diodes in the blue-green and LIV wavelenglhs, LIV detectors arid ultrahigh power switches. The main challenges in this technology are optimization of optical output etficienc and stability of metal contacts. One objective of the MSEL project on GaN is to quantify the effect of GaN defects, in particular of threading dislocations, on these properties, hi EY2002 a mechanism for the degradation of electrical contacts through threading dislocation-mediated phase transformations was determined through detailed characterization using transmission electron microscopy Doping methods to disable the mechanism may lead to greatly improved stahillt reliabiIiti and performance of commercial GaN devices.
机译:Lii-V族氮化物和GaN,特别是用于电子设备的新半导体,包括蓝绿色和LIV Wavelengls中的光亮二极管(LED)和激光二极管,LIV探测器干旱超高电源开关。该技术的主要挑战是光输出ETFICIEN的优化和金属触点的稳定性。 GaN的MSEL项目的一个目的是量化GaN缺陷的效果,特别是穿线脱位,在这些特性上,通过使用详细表征来确定通过穿线脱位介导的相变的电触点劣化的机制透射电子显微镜掺杂方法禁用该机制可能导致大大提高的稳定性粘连性和商用GaN装置的性能。

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