Customizing topographical parameters for mainstream thin film science

摘要

Surface topography refers to the local deviation of surface from ideally flat nature. It is imperative to study surface topography, as it can restrain opto-electrical properties of thin films. However, the abstractness of these parameters causes lack of systematic studies on the surface topography in the mainstream thin film science. In this work, we present methodical studies on scarcely premeditated topographic parameters in thin film science. Bi_2S_3 thin films were prepared through modest arrested precipitation technique and were soft-annealed at 50°C, 100°C, 150°C and 200°C. The structural studies revealed that, Bi_2S_3 films were formed with orthorhombic structure. Atomic force microscopy (AFM) was used for the mapping of surface topography. Number of topographic parameters were recorded and studied to establish the influence of soft-annealing on surface topography.