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Effect of Composition of Post Etch Residues (PER) on Their Removal in Choline Chloride-Malonic Acid Deep Eutectic Solvent (DES) System (PPT)

机译：蚀刻后残留物（PER）的组成对胆碱 - 丙酸盐深共晶溶剂（DES）系统（PPT）中的去除

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BEOL CLEANING FORMULATIONS BASED ON CHOLINE CHLORIDE/MALONIC ACID DEEP EUTECTIC SOLVENT SYSTEMS ARE ENVIRONMENTALLY FRIENDLY ALTERNATIVES FOR TRADITIONAL CLEANING FORMULATIONS 1. CC/MA BES removes inorganic and mixtures of organic and inorganic PER 2. HAc/CC/MA DES is a promising cleaning formulation to remove PER and PR.

机译：基于胆碱/丙酸盐深凝胶系统的BEOL清洗配方是传统清洗配方的环保替代品1. CC / MA BES除去每2. HAC / CC / MAS的有机和无机混合物是一种有前途的清洁配方每次和公关删除。

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《SEMATECH Surface Preparation and Cleaning Conference》|2012年||共9页
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Jenny Taubert; Srini Raghavan;
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中图分类工程材料学;
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Effect of Composition of Post Etch Residues (PER) on Their Removal in Choline Chloride-Malonic Acid Deep Eutectic Solvent (DES) System (PPT)

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