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Recombination Activity of Twin Boundaries in Silicon Ribbons

机译:硅丝带双界的重组活性

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摘要

Investigations of silicon layers grown on carbon foil were carried out using the Electron Beam Induced Current (EBIC) methods. The most of grain boundaries in these ribbons are (111) twin boundaries elongated along the <112> direction. The EBIC measurements showed that the recombination contrast of dislocations and of the most part of twin boundaries at room temperature is practically absent and only random grain boundaries and very small part of twin boundaries produce a noticeable contrast. At lower temperatures a number of electrically active twin boundaries increases but the most part of them remains inactive. A contamination with iron increases the recombination activity of random boundaries but not the activity of twin boundaries.
机译:使用电子束诱导电流(EBIC)方法进行在碳箔上生长的硅层的研究。这些丝带中的大部分晶界是(111)沿<112方向伸长的双界。 EBIC测量结果表明,脱位的重组对比度和在室温下的双界大部分的大部分是几乎不存在的,并且只有随机晶界和单界的非常小部分产生明显的对比度。在较低温度下,许多电活动双界增加,但它们的大部分保持不活跃。用铁的污染增加了随机界限的重组活性,但不是双界的活性。

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