Influence of Annealing Temperature on the Structure and Electrochromic Properties of NiO_x Thin Films

摘要

The NiO_x thin flims deposited on SnO_2/glass substrates by RF sputtering were investigated through XRD, SEM, spectrophotometer and Cyclic voltammetry. The relationship between electrochromic properties and micro-structure of NiO_x was also studied. Results show that NiO_x films prepared by sputtering are preferred to grow along (200) direction; the crystallize size of NiO_x films increases and the transmittance of colored and bleached states of NiO_x films also increases with annealing temperature rising, but the transmittance different between bleached and coloured states reduces. The declined electrochromic propertiey of NiO_x with the increase of annealing temperature is also found.