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Dynamic scan operation of actinic EUVL mask blank inspection system with TDI mode - (PPT)

机译:具有TDI模式的散光EUVL掩模空白检测系统的动态扫描操作 - (PPT)

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Actinic dark-field mask blank inspection tool with Time Delay and Integration (TDI) mode was achieved. Threshold method is used to identify phase defects. Sensitivity of detecting small defect such as 1.5 nm in height and 60 nm in width was confirmed, but capture rate must be improved. Inspection results were compared with non-actinic tool. Defects detected only with the actinic system were mostly pit phase defects smaller than 100 nm while small particles were detected only with non-actinic tool. Possibility of detecting phase defects on a mask with absorber patterns was demonstrated. Activities planned: Inspection signal noise reduction for fast TDI operation. Collect/compile inspection data of multilayer native defects.
机译:实现了具有时间延迟和集成(TDI)模式的幻影暗场掩模空白检查工具。阈值方法用于识别相位缺陷。确认了检测小缺陷的敏感性,例如高度为1.5nm,宽度为60nm,但必须提高捕获速率。将检查结果与非散装工具进行比较。仅使用光化系统检测的缺陷大多数小于100nm的坑相缺陷,而仅使用非散装工具检测小颗粒。证明了用吸收图案的掩模上检测相缺陷的可能性。计划的活动:快速TDI操作的检查信号降噪。收集/编译多层原生缺陷的检查数据。

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