Challenges in EUV Mask Repair - Deposition. Need accurate 3-D profile control of deposited area. Need image verification by actinic AIMS tool. Actinic Mask Metrology Tools Required for HVM User funding of NRE is necessary. Actinic BI, AIMS, and PMI tools are required for HVM of EUV masks Consensus by SEMATECH EUV Mask TWG. User funding of NRE is required in order to build these tools in time Consensus by SEMATECH EUV Mask BWG.
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