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Interface design and properties in InAs/GaSb type-II superlattices grown by molecular beam epitaxy

机译:分子束外延生长的INAS / GASB Type超晶图中的界面设计与属性

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In this paper we reported our systematic studies on InSb interface growth in InAs/GaSb SLs structure. Two typical interfaces growth mode, migration-enhanced epitaxy (MEE) and conventional molecular beam epitaxy (MBE), were designed for the 12 ML InAs/12 ML GaSb SLs material and the detail properties were discussion by the experimental measurement and simulation analysis. Our results indicated that the surface of SLs sample with the InSb interface layers grown by MEE method shows smaller RMS both on the 2 μm x 2 μm and 50 μm x 50 μm scan area by AFM measurement, and its PL intensity is about 1.3 times stronger than that of SLs sample grown by MBE. Besides, the MEE samples had significant As composition in InSb interface layers which was extracted by the HRXRD fitting.
机译:在本文中,我们向INAS / GASB SLS结构中的INSB界面生长进行了系统研究。两个典型的界面生长模式,迁移增强的外延(MEE)和常规分子束外延(MBE)设计用于12ml InAs / 12ml气体SLS材料,并通过实验测量和模拟分析进行细节性质。我们的结果表明,使用MEE方法生长的INSB接口层的SLS样品表面在2μm×2μm和50μm×50μm扫描区域上显示较小的RMS,通过AFM测量,其PL强度越强度约为1.3倍。比MBE种植的SLS样本。此外,MEE样品作为INSB界面层中的组合物具有重要意义,其被HRXRD配件提取。

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