Refined Coarse-Grain Modeling of Stamp Deformation in Nanoimprint Lithography

摘要

A refined version of the IMPRINT software is applied for simultaneous calculation of the resist viscous flow in thermal nanoimprint lithography and the stamp/substrate deformation. This version applies a modified coarse-grain method as well as takes into account the composition and elastic properties of the imprint setup (the stamp/substrate + "pressure buffer layers"). The presented comparison of calculated and experimental results confirms the potential of the IMPRINT software as an efficient tool for the reduction of the stamp bending,