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TOTAL DOSE BEHAVIOR OF PARTIALLY DEPLETED DELECUT SOI MOSFETS

机译:部分耗尽的Delecut SOI MOSFET的总剂量行为

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摘要

The effect of gamma-irradiation on the electrical characteristics of MOSFETs fabricated in DeleCut SOI wafers was defined. Properties of gate-oxide and BOX (buildup of radiation-induced charge in the oxide, interface state density and the initial concentration of traps in the oxide) were determined for DeleCut SOI MOSFETs and compared with that for thermal oxide on bulk silicon, Unibond and SIMOX wafers.
机译:定义了γ-辐射对Delecut SOI晶片制造的MOSFET电特性的影响。为Delecut SOI MOSFET测定栅极 - 氧化物和盒子中的氧化物中辐射诱导电荷的辐射诱导电荷,氧化物中的捕集电荷的初始浓度),并与散装硅,单轴和氧化物的热氧化物相比Simox晶片。

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