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Growth of GaN Quantum Well Film on Si Substrate and Its Application to a GaN-Si Hybrid Lightning Device

机译:Si衬底上GaN量子孔膜的生长及其在GaN-Si杂交闪电装置上的应用

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We propose here a new light source with a light beam steering mechanism. The direction of the light beam emitted from an array of the light emitting diodes (LEDs) can be changed by a micro-actuator. The proposed device is monolithically composed of the GaN LEDs and Si MEMS structure. Basic researches on the growth of GaN crystals on Si substrate were carried out. Quantum well (QW) structures consisting of InGaN/GaN crystals were formed with a buffer layer between the GaN crystal and Si substrate. Column-like GaN crystals with the QWs were grown. Due to the column structure and the buffer layer, the crystals were relaxed enough to obtain strong photoluminescence. From Si substrate with GaN crystal, a micro-stage with comb actuators on which the InGaN/GaN QW film is patterned has also been fabricated
机译:我们在此提出具有光束转向机构的新光源。可以通过微致动器改变从发光二极管阵列(LED)的光束的方向。所提出的装置是由GaN LED和SI MEMS结构单独组成的。进行了对Si衬底GaN晶体生长的基本研究。由ingaN / GaN晶体组成的量子阱(QW)结构用GaN晶体和Si衬底之间的缓冲层形成。生长柱状GaN晶体。由于柱结构和缓冲层,晶体足够放松以获得强烈的光致发光。从Si衬底与GaN晶体,带有梳状致动器的微级,也制造了图案化IngaN / GaN QW薄膜的梳子致动器

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