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Investigation on the Stability of a Au-Sn Electroplating Solution

机译:Au-Sn电镀溶液稳定性研究

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Au-Sn alloys, with a range of compositions, can be successfully pulse plated onto blank wafers and patterned wafers using a slightly acidic, chloride based solution. However, the plating solutions have limited stability (about two to three days), after which deposit compositions are not controllable. The aim of this work was to employ a number of characterization techniques to study the degradation of the plating solution in an effort to develop an understanding of the causes and mechanisms associated with instability. The techniques employed include scanning and transmission electron microscopy (SEM/TEM), x-ray diffraction (XRD), ultraviolet/visible (UV/Vis) spectroscopy and turbidity measurements. Nano-sized Au particles (<10 nm), were present in freshly mixed solutions. These increased in number over time, peaking out after about two days, before agglomerating into visible particles. UV/Vis spectroscopic analysis showed that ascorbic acid (present in the electroplating solution) acted as a reducing agent for the ionic complexes of gold.
机译:具有一系列组合物的Au-Sn合金可以成功地脉冲镀在坯料晶片上并使用微酸性的氯化物的氯化物溶液覆盖到坯料晶片上和图案化的晶片上。然而,电镀溶液具有有限的稳定性(约两至三天),之后沉积组合物不可控制。这项工作的目的是采用许多表征技术来研究电镀解决方案的劣化,以便制定对与不稳定性相关的原因和机制的理解。所用技术包括扫描和透射电子显微镜(SEM / TEM),X射线衍射(XRD),紫外/可见(UV / VIS)光谱和浊度测量。纳米大小的Au颗粒(<10nm),存在于新鲜混合的溶液中。这些随着时间的推移而增加,在约两天后达到峰值,然后凝聚到可见颗粒。 UV / Vis光谱分析表明,抗坏血酸(在电镀溶液中存在)用作金属离子配合物的还原剂。

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