【24h】

Synergetic effects of wafer thinning and 3D stacking

机译:晶圆减薄和3D堆叠的协同作用

获取原文

摘要

Chip-scale packages (CSPs) produced with a WLP process flow are particularly advantageous when combined with flip-chip/BGA connections, since direct-chip attach (DCA) parts can thus be produced entirely by a wafer-fab. A new process technology -atmospheric downstream plasma (ADP) gas thinning - allows for the formation of backside thru-silicon contacts for DCA applications. Thru-Silicon designs and manufacturing process flows are introduced as means to produce 3D stacking solutions. Standard silicon IC manufacturing unit-processes must be combined into robust process-flows to allow for the rapid deployment of 3D stacking throughout the industry.
机译:当与倒装芯片/ BGA连接组合时,用WLP处理流产生的芯片级封装(CSP)是特别有利的,因为直接芯片附着(DCA)部件因此可以完全由晶片-Fab生产。一种新的工艺技术 - 散流等离子体(ADP)气体变薄 - 允许形成DCA应用的背面通过硅接触。通过硅设计和制造过程流量被引入生产3D堆叠解决方案的手段。标准硅IC制造单元流程必须组合成强大的流程,以便在整个行业中快速部署3D堆叠。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号