Plasma Etching with Metallic Masking for Micro-Patterning onto DLC Coated Mold-Dies

摘要

Diamond like carbon (DLC) coating is used as a mold-die material to imprint the designed micro-patterns onto optical plastic and oxide-glass products. The plasma etching system is developed to make micro-patterning onto DLC coating only by oxygen gas without any etchants. In-situ plasma diagnosis by spectroscopy is performed to describe the plasma chemistry during plasma etching process. The chromium-masked DLC coating is prepared as a test-specimen for plasma etching; micro-groove patterns with different widths and pitches are also accommodated to analyze the present etching behavior. When DC bias is -450 V, and pressure, 40 Pa, the etching rate reaches to 5μm/H.