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Structural and Electronic Properties of Hydrogen-passivated Silicon Quantum Dots: Density Functional Calculations

机译:氢钝化硅量子点的结构和电子性质:密度函数计算

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Density functional theory (DFT) by numerical basis-set calculations of silicon quantum dots (Si-QDs) passivated by hydrogen, ranging in size up to 1.9 nm are presented. These DFT computation results are used to examine and deduce the properties of 14 spherical Si-QDs including its density of state (DOS), and energy gap from the HOMO-LUMO results. The atomistic model of each silicon QDs was constructed by repeating crystal unit cell of face-centered cubic (FCC) structure, then the QDs surface was passivated by hydrogen atoms. The model was relaxed and optimized using Quasi-Newton method for each size of Si-QDs to get an ideal structure. Exchange-correlation potential (V_(xc)) of electrons were approximated in this system using the Local Density Approximation (LDA) functional and Perdew-Zunger (PZ) functional. Finally, all results were compared with previous experimental data and other similar theoretical approaches, and these results augured well.
机译:通过氢气钝化的数值基础设定的数值基础设置的密度函数理论(DFT),呈现尺寸高达1.9nm的硅量子点(Si-QD)。这些DFT计算结果用于检查和推导在包括其状态(DOS)的密度和来自HOMO-Lumo结果的能量隙的特性。每种硅QD的原子模型是通过重复面式立方体(FCC)结构的晶体单元电池构成的构成,然后QDS表面被氢原子钝化。使用Quasi-Newton方法进行轻松和优化模型,以获得每个尺寸的Si-QD以获得理想的结构。使用局部密度近似(LDA)功能和Perdew-Zunger(PZ)功能,电子的交换相关电位(v_(xc))近似于该系统。最后,将所有结果与先前的实验数据和其他类似的理论方法进行比较,这些结果良好。

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