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Structural and Electrical Properties of Sol-gel Spin Coated Indium Doped Cadmium Oxide Thin Films

机译:溶胶 - 凝胶旋涂铟掺杂氧化镉薄膜的结构和电性能

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The indium doped CdO thin films have been prepared by the sol-gel spin coating technique and the influence of indium doping concentration on the structural and electrical properties of the deposited films has been investigated. The indium doping concentration in the solution has been varied from 0-10 wt% insteps of 2wt%. A indium doping concentration of 6wt% has been found to be optimum for preparing the films and at this stage a minimum resistivity of 5.92×10~(-4)Ω cm and a maximum carrier concentration of 1.20×10~(20)cm~(-3) have been realized.
机译:通过溶胶 - 凝胶旋转涂层技术制备掺杂铟的CDO薄膜,并研究了已经研究过掺杂掺杂浓度对沉积膜的结构和电性能的影响。溶液中的铟掺杂浓度从0-10wt%的2wt%的0秒变化。已经发现6wt%的铟掺杂浓度是最佳的用于制备薄膜,并且在该阶段最小电阻率为5.92×10〜(-4)Ωcm,最大载流量为1.20×10〜(20)cm〜 (-3)已经实现了。

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