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Influence of Bath Temperature on the Properties of In2S3 Films Grown by Chemical Bath Deposition

机译:浴温对化学浴沉积生长的In23膜性能的影响

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In2S3 films were deposited by chemical bath deposition (CBD) method on glass substrates using indium sulphate and thioacetamide (TA) as precursors and acetic acid as the complexing agent. The films were grown by varying the bath temperature (T_b) from 50°C to 90°C, keeping concentration of indium precursor at a constant value of 0.025 M and thioacetamide concentration at 0.1 M for a fixed deposition time of 60 min. X-ray diffraction (XRD) studies revealed that the deposited films were nanocrystalline in nature and showed the (311) peak as preferred orientation, exhibiting cubic structure. The Raman studies revealed that the grown layers were free from secondary phases. The scanning electron microscopy (SEM) studies indicated smooth morphology at lower temperatures that changed in to granular structure at higher temperatures. Energy dispersive X-ray analysis (EDAX) revealed a change of composition from sulfur deficient to sulfur rich at a bath temperature of 70°C. The optical measurements showed that the films had a maximum transmittance of >85% in the visible region. The evaluated energy band of the layers varied in the range, 2.36-2.74 eV with the change of bath temperature. A detailed study of the results were presented and discussed.
机译:在使用硫酸铟和硫代乙酰胺(Ta)作为前体和乙酸作为络合剂,通过化学浴沉积(CBD)方法在玻璃基板上沉积In2S3膜。通过改变50℃至90℃的浴温(T_B)生长薄膜,以0.025μm的恒定值保持铟前体,并在0.1μm下以0.1μm的固定沉积时间为60分钟。 X射线衍射(XRD)研究表明,沉积的薄膜本质上是纳米晶体,并显示(311)峰作为优选取向,表现出立方结构。拉曼研究表明,生长的层免于二次相。扫描电子显微镜(SEM)研究表明在较低温度下的较低温度下的平滑形态,在较高温度下变为粒状结构。能量分散X射线分析(edax)揭示了富含硫的硫在70℃的浴温缺乏硫的组合物的变化。光学测量表明,薄膜在可见区域中的最大透射率> 85%。该层的评估能带在范围内变化,2.36-2.74eV随着浴温而变化。提出和讨论了对结果的详细研究。

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