首页> 外国专利> Thin-film processing system useful for chemical bath deposition on solar cell substrates for treatment of substrates, comprises solution delivery unit, unit for chemical bath deposition, and solution outflow

Thin-film processing system useful for chemical bath deposition on solar cell substrates for treatment of substrates, comprises solution delivery unit, unit for chemical bath deposition, and solution outflow

机译:用于在太阳能电池基板上进行化学浴沉积以处理基板的薄膜处理系统,包括溶液输送单元,化学浴沉积单元和溶液流出系统

摘要

Thin-film processing system for chemical bath deposition on solar cell substrates for treatment of substrates, which has a disuse zone and a processing zone and forms a closure structure, comprises (i) a solution delivery unit for introducing a solution in the closure structure, which is to be transported, (ii) a unit for chemical bath deposition, which is arranged downstream to the solution delivery unit and receives the closure structure, which is transported by the solution delivery unit, and (iii) a solution outflow, which is arranged downstream to the unit for chemical bath deposition. Thin-film processing system for chemical bath deposition on solar cell substrates for treatment of substrates, which has a disuse zone and a processing zone and forms a closure structure, comprises (i) a solution delivery unit for introducing a solution in the closure structure, which is to be transported so that the processing zone of the substrate is completely covered by the solution, (ii) a unit for chemical bath deposition, which is arranged downstream to the solution delivery unit and receives the closure structure, which is transported by the solution delivery unit, and (iii) a solution outflow, which is arranged downstream to the unit for chemical bath deposition. The disuse zone is an edge surface of the substrate, on which the deposition process has no effect. The processing zone is the surface, which is not covered by the disuse zone. The substrate comprises a hermetic contact with a solution covering during chemical bath deposition and forms the closure structure comprising a closure space together with the solution covering. The solution and a thin film are present in the closure space during deposition. The chemical bath deposition is carried out during the transport of the closure structure, and the closure structure is further transported, after the formation of the thin film. The solution outflow receives the closure structure from the unit for chemical bath deposition, and decants the solution present in the closure structure. An independent claim is also included for thin film processing method for the chemical bath deposition on solar cell substrates using processing system comprising introducing the solution into the closed structure so that the processing zone of the substrate is complexly covered by the solution, and decanting the solution from the closure structure after bath deposition process.
机译:用于在太阳能电池基板上进行化学浴沉积以处理基板的薄膜处理系统,其具有废区和处理区并形成封闭结构,该系统包括(i)溶液输送单元,用于将溶液引入封闭结构中, (ii)用于化学浴沉积的单元,其布置在溶液输送单元的下游,并接收由溶液输送单元输送的封闭结构,以及(iii)溶液流出布置在用于化学浴沉积的单元的下游。用于在太阳能电池基板上进行化学浴沉积以处理基板的薄膜处理系统,其具有废区和处理区并形成封闭结构,该系统包括(i)溶液输送单元,用于将溶液引入封闭结构中,溶液将被运输,以使基板的处理区域完全被溶液覆盖;(ii)化学浴沉积单元,该单元布置在溶液输送单元的下游,并接收封闭结构,该封闭结构由溶液运输溶液输送单元,和(iii)溶液流出,其布置在用于化学浴沉积的单元的下游。废料区是基板的边缘表面,在该边缘表面上的沉积过程无效。加工区是表面,未被废弃区覆盖。所述基底包括在化学浴沉积期间与溶液覆盖物的气密接触,并形成包括封闭空间和溶液覆盖物的封闭结构。在沉积过程中,溶液和薄膜存在于封闭空间中。在封闭结构的运输期间进行化学浴沉积,并且在形成薄膜之后进一步运输封闭结构。溶液流出物从用于化学浴沉积的单元接收封闭结构,并倾析存在于封闭结构中的溶液。还包括使用处理系统在太阳能电池基板上进行化学浴沉积的薄膜处理方法的独立权利要求,该处理系统包括将溶液引入封闭结构中,从而使基板的处理区域被溶液复杂地覆盖,然后倒出溶液。从浴沉积过程后的封闭结构中去除。

著录项

  • 公开/公告号DE102013108240A1

    专利类型

  • 公开/公告日2014-02-27

    原文格式PDF

  • 申请/专利权人 MANZ TAIWAN LTD.;

    申请/专利号DE201310108240

  • 发明设计人 CHEN CHUAN-YI;YU PO-CHING;

    申请日2013-07-31

  • 分类号H01L31/18;H01L21/288;H01L21/368;H01L21/445;H01L21/67;C23C18/00;

  • 国家 DE

  • 入库时间 2022-08-21 15:37:21

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