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Physical properties of In2S3 thin films grown by chemical bath deposition at different temperatures

机译:通过化学浴沉积在不同温度下生长的In2S3薄膜的物理性质

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Indium sulphide thin films were deposited on SnO 2 :F/soda-lime glass substrates at different temperatures by chemical bath deposition. InCl 3 and C 2 H 5 NS were employed as indium and sulfur sources, respectively. The In 2 S 3 films were deposited at temperatures of: 60 °C, 70 °C and 80 °C. The as-grown films were annealed at 300 °C in nitrogen atmosphere. The physical properties were analyzed as a function of the bath temperature, before and after the thermal treatment. The X-ray diffraction and Raman characterizations indicate that In 2 S 3 films with tetragonal p hase were obtained. Atomic force microscopy showed that after the annealing features of grain coalescence on surface are present. The UV-Vis analysis indicated that after thermal treatment In 2 S 3 films have high transmission in the visible range and a bandgap above 2.50 eV.
机译:通过化学浴沉积在不同的温度下将硫化铟薄膜沉积在SnO 2:F /钠钙玻璃基板上。 InCl 3和C 2 H 5 NS分别用作铟和硫源。 In 2 S 3膜在以下温度下沉积:60°C,70°C和80°C。将生长的薄膜在氮气气氛中于300°C退火。在热处理之前和之后,根据浴温的函数分析物理性质。 X射线衍射和拉曼光谱表征表明,获得了具有四方晶形的In 2 S 3膜。原子力显微镜显示,退火后表面上存在晶粒聚结的特征。 UV-Vis分析表明,在In 2 S 3中进行热处理后,薄膜在可见光范围内具有高透射率,并且带隙在2.50 eV以上。

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