首页> 外国专利> METHOD FOR FABRICATING CuInS2 THIN FILM BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION, CuInS2 THIN FILM FABRICATED BY THE SAME AND METHOD FOR FABRICATING In2S3 THIN FILM THEREFROM

METHOD FOR FABRICATING CuInS2 THIN FILM BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION, CuInS2 THIN FILM FABRICATED BY THE SAME AND METHOD FOR FABRICATING In2S3 THIN FILM THEREFROM

机译:通过金属有机化学气相沉积制备CuInS2薄膜的方法,用相同的方法制备的CuInS2薄膜及其制备In2S3薄膜的方法

摘要

Disclosed is a method for fabricating a CuInS2 thin film by metal-organic chemical vapor deposition (MOCVD). The method comprises fabricating a copper thin film by depositing an asymmetric copper precursor on a substrate by MOCVD and fabricating a CuInS2 thin film by depositing an indium-sulfur-containing precursor on the copper thin film by MOCVD. The method enables fabrication of a CuInS2 thin film with a constant composition even under vacuum as well as an argon (Ar) atmosphere. Disclosed is further a CuInS2 thin film fabricated by the method. Disclosed is further a method for fabricating an In2S3 thin film for a window of a solar cell via deposition of an indium-sulfur-containing precursor on the CuInS2 thin film by MOCVD. Disclosed further is an In2S3 thin film fabricated by the method. The In2S3 thin film is useful for a substitute for CdS conventionally used for windows of solar cells and contributes to simplification in fabrication process of solar cells.
机译:公开了一种通过金属有机化学气相沉积(MOCVD)来制造CuInS 2 薄膜的方法。该方法包括通过MOCVD在基板上沉积不对称的铜前驱体来制造铜薄膜,以及通过MOCVD在铜薄膜上沉积含铟硫的前驱体来制造CuInS 2 薄膜。该方法使得即使在真空以及氩(Ar)气氛下也能够制造具有恒定组成的CuInS 2 薄膜。还公开了通过该方法制造的CuInS 2 薄膜。还公开了一种通过在CuInS 2 S 3 薄膜的方法。通过MOCVD制备> 2 薄膜。还公开了通过该方法制造的In 2 S 3 薄膜。 In 2 S 3 薄膜可替代传统上用于太阳能电池窗的CdS,有助于简化太阳能电池的制造工艺。

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