The MURA graphics problems in large area photomask for concept-based data mining techniques

摘要

The MURA problems will result lots of problems in photomask and TFT-LCD industries as well. In this paper, we propose a new concept for the photomask production industries, which is based on data mining techniques. Our model is suitable for every company which has the problems in MURA effects. Because our data mining techniques is a way collecting the correct information by itself, it could clean the data through their own expert. By building their own expert data warehouse, it could make our data mining techniques become a optimization mining technique, which means our model is one of the best solution to them. It could be suitable not only for every photomask company but also companies facing to the MURA problems. Our model helps them to cut down their manufacturing cost as well as promote the quality of their products.