Effect of substrate temperature and ion assistance on nanosecond laser-induced damage threshold in high reflection dielectric coatings

摘要

An influence of substrate temperature and working gas in coating plant during evaporation process on the laser-induced damage threshold (LIDT) of high reflection dielectric coatings was experimentally investigated. Also a LIDT comparison of ion assisted deposition (IAD) and conventional electron-beam evaporation (non-IAD) coatings fabricated under the same substrate temperature (300 °C) was performed. A set of different type high reflection mirrors were tested for LIDT at 532 nm for 3.4 ns pulses: one type of non-IAD and six types of IAD evaporated at different substrate temperatures and different working gases. All coatings were made on BK7 glass substrates from ZrO2 and SiO2. The computer controlled test station for LIDT measurements according to the requirements of current ISO 11254-2 standard was used. All measurements were performed at 10 Hz pulse repetition rate (S-on-1 test). The tests were performed at fixed spot size. Strong LIDT dependence on substrate temperature of was observed.