Investigating the relationship between material properties and laser-induced damage threshold of dielectric optical coatings at 1064 nm

摘要

The Laser Induced Damage Threshold (LIDT) and material properties of various multi-layer amorphous dielectricudoptical coatings, including Nb2O5, Ta2O5, SiO2, TiO2, ZrO2, AlN, SiN, LiF and ZnSe, have been studied. The coatingsudwere produced by ion assisted electron beam and thermal evaporation; and RF and DC magnetron sputtering at HeliaudPhotonics Ltd, Livingston, UK. The coatings were characterized by optical absorption measurements at 1064 nm byudPhotothermal Common-path Interferometry (PCI). Surface roughness and damage pits were analyzed using atomic forceudmicroscopy. LIDT measurements were carried out at 1064 nm, with a pulse duration of 9.6 ns and repetition rate of 100udHz, in both 1000-on-1 and 1-on-1 regimes. The relationship between optical absorption, LIDT and post-deposition heattreatmentudis discussed, along with analysis of the surface morphology of the LIDT damage sites showing both coatingudand substrate failure.