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Performance and Fabrication of GaN/AlGaN Power MMIC at 10 GHz

机译:10 GHz的GaN / Algan Power MMIC的性能和制造

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High performance and fabrication of a coplanar 2 stage power amplifier based on a GaN/AlGaN HEMT technology on 2-inch SiC substrate has been realized. At 10 GHz the coplanar MMIC delivers a maximum output power of 13.4 W, measured on wafer in pulsed mode, a linear gain of 20 dB and a maximum PAE of 25 % at a V_(DS) bias of 35 V and compression level of 5 dB. The yield of the MMICs across 2-inch wafer is 65 %.
机译:基于2英寸SiC基板的GaN / AlGaN HEMT技术,实现了基于GaN / AlGaN HEMT技术的共面2级功率放大器的高性能和制造。在10 GHz下,共面MMIC在脉冲模式下测量的最大输出功率为13.4W,在脉冲模式下测量,线性增益为20 dB,最大PAE为35 V和压缩水平的V_(DS)偏差为5 D b。跨2英寸晶片的MMIC的产量为65%。

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