Effect of Ion Implantation on the Structural and Optical Properties of Thermally Evaporated Cd_(1-x)Zn_xTe Thin Films

机译：离子植入对热蒸发CD_（1-X）Zn_XTE薄膜的结构和光学性质的影响

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Polycrystalline thin films of Cd_(0.96)Zn_(0.04)Te were deposited onto well-cleaned glass substrates at 300K. Boron ions with energy 110 keV in the dose range of 10~(13) ions/cm~2 were implanted and the effect of ion implantation on the structural and optical properties are discussed.

机译：将CD_（0.96）Zn_（0.04）TE的多晶薄膜沉积在300k的良好清洁的玻璃基板上。植入了10〜（13）离子/ cm〜2的剂量范围内能量范围110keV的硼离子，并讨论了离子注入对结构和光学性质的影响。

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《International Workshop on the Physics of Semiconductor Devices》|2002年||共4页
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M. Sridharan; Hee Chul Lee; Sa. K. Narayandass; D. Mangalaraj;
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Effect of Ion Implantation on the Structural and Optical Properties of Thermally Evaporated Cd_(1-x)Zn_xTe Thin Films

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