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Investigations on Structural Optical and X-Radiation Responsive Properties of a-Se Thin Films Fabricated by Thermal Evaporation Method at Low Vacuum Degree

机译:低真空度热蒸发法制备a-Se薄膜的结构光学和X射线响应特性研究

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摘要

Amorphous selenium (a-Se) thin films with a thickness of 1200 nm were successfully fabricated by thermal evaporation at a low vacuum degree of 10−2 Pa. The structural properties involving phase and morphology showed that a-Se thin films could be resistant to 60 °C in air. Also, a transformation to polycrystalline Selenium (p-Se) was shown as the annealing temperature rose to 62 °C and 65 °C, with obvious changes in color and surface morphology. Moreover, as the a-Se transformed to p-Se, the samples’ transmittance decreased significantly, and the band gap declined dramatically from 2.15 eV to 1.92 eV. Finally, the X-radiation response of a-Se was investigated as an important property, revealing there is a remarkable response speed of photogeneration current both X-ray on and X-ray off, with a requirement of only a very small electrical field.
机译:通过在低真空度10 -2 Pa下进行热蒸发,成功制备了厚度为1200 nm的非晶硒(a-Se)薄膜。涉及相和形貌的结构特性表明,a-硒薄膜可以在空气中耐受60°C。此外,随着退火温度上升到62°C和65°C,向多晶硒(p-Se)的转变也表现出,其颜色和表面形态发生了明显变化。此外,随着a-Se转变为p-Se,样品的透射率显着下降,带隙从2.15 eV急剧下降至1.92 eV。最后,研究了a-Se的X射线辐射响应的重要特性,它揭示了X射线接通和X射线断开时光生电流的显着响应速度,仅需很小的电场即可。

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