FABRICATION METHOD AT MICROMETER- AND NANOMETER- SCALES FOR GENERATION AND CONTROL OF ANISOTROPY OF STRUCTURAL, ELECTRICAL, OPTICAL AND OPTOELECTRONIC PROPERTIES OF THIN FILMS OF CONJUGATED MATERIALS

摘要

Unconventional photoetching process modification, improves and manufactures the anisotropy of structure, organize and have subscribed, and anisotropy is mechanical, electricity, optics, photoelectronics, and the film that charge carries and energy load performance is made of organic material has biconjugate key. This method include it is molded, directly conjugated thin film due to closely with the surface of mold. It is that local symbol and whose size depend on the size offer mold of structure that the part film, which directly contacts mold by conversion,. Both it can carry out being molded into static conditions and dynamic condition. The validity of method depends on characteristic (the pressure P and temperature T of material and shape, viscosity and surface tension and molding process (combination) of mold, duration), wherein mould on the way engage and contact occur when, for the dynamic process mold speed relative to sample. The effect has been proved to the process of description from tens microns (10-6 meters) to tens nonometers (10-9 meters) for space scale.