Structure of the thin film of the conjugate material, electric, optical and anisotropy of photoelectricity quality production method where it forms and controls with the micro meter scale and the nano- meter scale and the

摘要

Topic The new lithography method the structural anisotropy in the thin film which consists of the organic material which has double conjugate connection, organization and orientation and mechanical of the thin film, electric, optical, of altering the anisotropy of the quality of optical erekutoronitsukusu, electric charge conveyance and energy conveyance, it improves and forming.SolutionsThis method forms directly in the conjugate thin film with the close contact with the surface of type. As for the membrane part which contacts with type directly, with respect to quality the localized mark it receives conversion, as for the size it depends on the size of the structure which is provided in type. Formation, static condition and dynamic condition being both, is feasibility. Effectiveness of this process depends, type characteristic (the material and form, stickiness and boundary tension) with formation process in the middle which engagement and contact occur (combination with the pressure P and temperature T and formation duration) with in addition, when it is dynamic process, depends on the speed of the type for the sample. Several dozen micro meters (10^-6 m) or several dozen nano- meters (10^-9 m) vis-a-vis the spatial scale, the effect of statement process was shown. Selective figure Figure 1a