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Power RF-Operation of AlGaN/GaN HEMTs Grown on Insulating Silicon Carbide Substrates

机译:在绝缘碳化硅基材上生长的AlGaN / GaN Hemts的功率RF操作

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摘要

We report on the technology and microwave characterization of AlGaN/GaN power HEMTs on SiC substrate. DC and S-parameter are discussed, together with load-pull results on devices up to 4mm gate width. A power density of 5.2 W/mm is obtained for devices up to 2 mm gate width. The maximum power level achieved is 13.8 W at 2 GHz.
机译:我们报告了SiC衬底Algan / GaN功率HEMT的技术和微波表征。讨论DC和S参数,以及负载 - 栅极宽度高达4mm的载荷结果。为高达2mm栅极宽度的器件获得5.2W / mm的功率密度。实现的最大功率水平是2 GHz的13.8W。

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