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IMPROVEMENT OF SUB-0.25 μm FULLY-DEPLETED SOI CMOS ANALOG PERFORMANCE BY THINNING THE SI FILM

机译:通过稀释Si薄膜改善Sub-0.25μm全耗尽的SOI CMOS模拟性能

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摘要

The present work demonstrates that deep-submicron FD MOSFETs exhibit outstanding properties for analog applications, well superior to comparable PD or bulk Si devices, in terms of gain, frequency, noise, swing... performance, provided that full depletion is ensured in all modes of operation by correct process optimization.
机译:本工作表明,深度亚微米FD MOSFET表现出用于模拟应用的卓越性能,优于比较的PD或散装SI器件,在增益,频率,噪声,摆动......性能方面,只要确保全部耗尽正确的过程优化操作模式。

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