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Interaction of degradation mechanisms in Be-doped GaAs HBTs

机译:掺杂GaAs Hbts中退化机制的相互作用

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Be-doped GaAs HBTs subjected to various life tests were found to degrade more rapidly than predicted by the current lifetime model. All failed devices which were examined exhibited the failure mode which is dominant for C-doped HBTs: increased base current at low voltages, accompanied by an increase in the base current ideality factor. Failed devices also showed an increase in the emitter-base turn-on voltage, indicating Be diffusion into the AlGaAs emitter. In addition to exhibiting two distinct degradation mechanisms, failure analysis data indicate interactions between these two mechanisms which support identification of the dominant failure mode under extended operation as recombination-enhanced defect reaction.
机译:发现受到各种寿命试验的具有掺杂GaAs HBT,比通过当前寿命模型预测得更迅速。检查的所有故障设备展示了对C掺杂HBT的主导的故障模式:低电压下的基极电流增加,伴随基本电流理想因素的增加。失败的设备还显示了发射极基导电电压的增加,表示扩散到Algaas发射器中。除了出现两个不同的降解机制之外,失败分析数据表明这两种机制之间的相互作用,其支持在扩展操作下识别显性失效模式作为重组增强的缺陷反应。

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