首页> 外文会议>Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 2000. 22nd Annual >Interaction of degradation mechanisms in Be-doped GaAs HBTs
【24h】

Interaction of degradation mechanisms in Be-doped GaAs HBTs

机译:掺杂GaAs HBT中降解机理的相互作用

获取原文

摘要

Be-doped GaAs HBTs subjected to various life tests were found to degrade more rapidly than predicted by the current lifetime model. All failed devices which were examined exhibited the failure mode which is dominant for C-doped HBTs: increased base current at low voltages, accompanied by an increase in the base current ideality factor. Failed devices also showed an increase in the emitter-base turn-on voltage, indicating Be diffusion into the AlGaAs emitter. In addition to exhibiting two distinct degradation mechanisms, failure analysis data indicate interactions between these two mechanisms which support identification of the dominant failure mode under extended operation as recombination-enhanced defect reaction.
机译:发现经过各种寿命测试的掺杂GaAs HBT的降解速度比当前寿命模型预测的更快。所有检查过的故障器件均表现出故障模式,该模式是C掺杂HBT的主要特征:低电压下的基极电流增加,同时基极电流理想因数也随之增加。发生故障的器件还显示出发射极-基极导通电压升高,表明Be扩散到AlGaAs发射极中。除了表现出两种不同的降解机理外,失效分析数据还表明了这两种机理之间的相互作用,这些相互作用支持了在扩展操作下将主要失效模式鉴定为重组增强的缺陷反应。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号