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Characterization of current-induced degradation in Be-doped HBTs based in GaAs and InP

机译:基于GaAs和InP的Be掺杂HBT中电流诱导降解的表征

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摘要

The changes in the device characteristics under high-bias conditions are investigated for InAlAs/InGaAs and AlGaAs/GaAs heterojunction bipolar transistors (HBTs) with heavily Be-doped base lasers, focusing on the base current and 1/f noise characteristics. It is shown that the ideality factor of the surface recombination base current provides information on the Be movement accompanying the degradation. For stress current densities up to 1.5*10/sup 5/ A/cm/sup 2/, the Be movement in the InAlAs/InGaAs HBTs is estimated to be no more than a small fraction of the 5 nm setback layer. The 1/f noise measurement highlight the effect of current stressing on the surface recombination in the HBTs. A characteristic spectral shape is found in the noise spectra for the current-stressed AlGaAs/GaAs HBT, possibly originating from the degradation-induced carrier traps. Although both HBTs have similar electronic properties, these results illustrate the striking difference in their stress current behaviors.
机译:对于高掺杂条件下的基本激光器的InAlAs / InGaAs和AlGaAs / GaAs异质结双极晶体管(HBT),研究了在高偏置条件下器件特性的变化,重点是基极电流和1 / f噪声特性。结果表明,表面复合基础电流的理想因子提供了有关伴随降解的Be运动的信息。对于高达1.5 * 10 / sup 5 / A / cm / sup 2 /的应力电流密度,InAlAs / InGaAs HBT中的Be运动估计不超过5 nm挫折层的一小部分。 1 / f噪声测量突出了电流应力对HBT中表面复合的影响。在电流应力AlGaAs / GaAs HBT的噪声频谱中发现了一个特征频谱形状,该频谱形状可能源自退化引起的载流子陷阱。尽管两种HBT具有相似的电子特性,但这些结果说明了它们在应力电流行为方面的显着差异。

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