Dynamic VHF-PECVD Deposition with Linear Plasma Sources for Amorphous and Microcrystalline Silicon Solar Cells (Overview)

摘要

The present article is an overview of our work to dynamic VHF-PECVD deposition with linear plasma sources for amorphous and microcrystalline silicon solar cells. Initial efficiencies of 9.4% (7% stabilized) have been achieved for amorphous silicon with substrate velocities up to 0.5 m/min. Microcrystalline silicon solar cells showed initial efficiencies of 6.35% (6.2% stabilized) with velocities up to 0.15 m/min. Both the deposition of a-Si:H and μc-Si:H were very homogeneous with thickness and crystallinity variations less than +/- 5% over 300 mm length of the electrode. This process principle has the general potential for enhancement of deposition width and frequency.