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Pulsed plasma deposition to form microcrystalline silicon layers for solar cells
Pulsed plasma deposition to form microcrystalline silicon layers for solar cells
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机译:脉冲等离子体沉积形成用于太阳能电池的微晶硅层
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摘要
A method for an intrinsic type microcrystalline silicon layer is provided. In one embodiment, the microcrystalline silicon layer is fabricated by providing a substrate into a processing chamber, supplying a gas mixture into the processing chamber, applying a RF power at a first mode in the gas mixture, pulsing the gas mixture into the processing chamber, and applying the RF power at a second mode in the pulsed gas mixture.
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