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Formation of nonuniformity in ZnSe/ZnMgSSe quantum well structures during MOVPE on GaAs(001) misoriented by 10° to (111 )_A plane

机译:在GaAs(001)上的MOVPE期间在ZnSe / Znmgsse量子阱结构中形成不均匀性10°至(111)_A平面

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ZnSe/ZnMgSSe quantum well structures grown by metal-organic vapor-phase epitaxy on GaAs substrate misoriented from (001) to (111)_A by 10° were studied. Low-temperature cathodoluminescence spectra of these structures showed doubling QW emission lines. The doubling was observed also at addition of Cd, Mg and S in the QWs with concentration of several percents. The reason of this effect was investigated by X-ray reflectometry and diffraction methods. Increasing of scattering with increasing penetration depth was found. It evidences changing QW parameters during the growth. Decomposition of ZnMgSSe solid solution was also observed. The main reason of the doubling was supposed to be due to mutual diffusion of Zn and Mg atoms at QW interfaces. The diffusion is stimulated by relaxation of internal stains or nonuniform distribution of point defects due to the ZnMgSSe decomposition.
机译:通过金属 - 有机气相外延生长的ZnSe / Znmgsse量子阱结构在从(001)至(111)_a的GaAs底物上产生10°。这些结构的低温阴极发光光谱显示出QW排放线的倍增。在QWS中加入QWS的CD,Mg和S的浓度也观察到加倍。通过X射线反射测量法和衍射方法研究了这种效果的原因。发现,增加散射随着渗透深度的增加。它证明在增长过程中改变了QW参数。还观察到Znmgsse固溶体的分解。倍增的主要原因应该是由于QW界面在Zn和Mg原子中的相互扩散。由于Znmgsse分解,通过松弛内部污渍或点缺陷的不均匀分布而刺激扩散。

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