首页> 外文会议>European conference on applied superconductivity >Influence of Ge addition on Nb_3Sn layer growth and electromagnetic properties in internal tin processed wires
【24h】

Influence of Ge addition on Nb_3Sn layer growth and electromagnetic properties in internal tin processed wires

机译:Ge加法对内部锡加工电线Nb_3Sn层生长和电磁特性的影响

获取原文

摘要

In order to investigate the effect of Ge addition to the Cu matrix on the microstructure and the critical current density, four kinds of internal tin processed Nb_3Sn wires with pure Cu and Cu ― 0.2, 0.4 and 0.6 wt.% Ge alloys were drawn to 0.8 mm diameter. The microstructure and critical current of internal tin processed Nb3Sn wires that were heat treated at temperatures ranging from 680 to 740 °C for 240 h were investigated. The Ge addition to the matrix did not make workability worse. A Ge rich layer in the Cu-Ge matrix suppressed the growth of the Nb_3Sn layer and promoted grain coarsening. The high AC loss which is disadvantage of internal tin processed Nb_3Sn compared with the bronze method wire decreased significantly by adding Ge, which resulted from increased resistance between Nb_3Sn filaments caused by segregation of Ge-rich layer. The longer heat treatment, the lower the net-J_c result in the Ge added wires because of large grains due to abnormal grain growth.
机译:为了研究Ge加入Cu基质对微观结构和临界电流密度的影响,具有纯Cu和Cu-0.2,0.2,0.6重量%的四种内部锡加工的Nb_3Sn线。%GE合金被拉到0.8 mm直径。研究了在从680至740℃的温度下进行热处理的内部锡加工Nb3sn线的微观结构和临界电流进行了680小时。矩阵的GE添加没有使可加工性更糟。 Cu-GE基质中的GE富含层抑制了Nb_3Sn层的生长和促进晶粒粗化。通过添加GE,与青铜方法线相比,内部锡加工Nb_3sn的高处理损失是由富含GE的富含GE富含GE富含GE的抗体引起的抗性抗性导致的耐血管造成的抗性,这是显着的。热处理较长,由于晶粒生长异常,净j_c导致电谷物的较低导线。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号