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Impact of Underfill Fillet Geometry on Interfacial Delamination in Organic Flip Chip Packages

机译:底部填充圆角几何对有机倒装芯片封装中界面分层的影响

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Underfill delamination jeopardy in flip chip organic packages is driven by shear and peeling interfacial stresses, which are directly impacted by underfill fillet geometry. Finite Element Analysis (FEA) models were used to analyze the effect of underfill height and width on interfacial stresses in a typical organic flip chip package configuration. Peeling and shearing stresses were computed for a large combination of fillet heights and widths (15 × 16 = 240). Three locations of interest: die bottom corner/underfill, die edge/fillet top and fillet bottom/substrate, were studied. For each location, 3D surface plots were generated to depict the variation of shear/peel stress simultaneously with width and height. An Analysis of Variance (ANOVA) was conducted for the full factorial Design of Experiments (DOE) to quantify the effect of underfill fillet height and width on the numerically computed shear and peel stresses at each location. Interaction among these variables was permitted and studied, and was found to be significant in some cases. The dominant factor(s) governing interfacial stresses for each location was identified and optimum values recommended. Limited data, with corner fillet heights in the range ~ 2% to 70% of die thickness, suggested adequate reliability for most field applications. Additional data are required to further validate the results.
机译:在倒装芯片封装有机底部填充脱层危险是通过剪切和剥离界面的应力,这是直接由底部填充圆角几何影响驱动。有限元分析(FEA)模型,用于分析在一个典型的有机倒装芯片封装结构的底部填充的高度和宽度对界面应力的作用。剥离和剪切应力计算了圆角的高度和宽度(15×16 = 240)的一个大的组合。三个感兴趣的位置:模底角/底部填充,管芯边缘/圆角顶部和底部圆角/底物,进行了研究。对于每个位置,产生了三维表面图与宽度和高度同时描绘剪切/剥离应力的变化。方差分析(ANOVA)是为实验(DOE)的全因子设计量化底部填充圆角的高度和宽度上在每个位置的数值地计算剪切和剥离应力的作用进行的。这些变量之间的相互作用被允许和研究,发现在某些情况下显著。管理每个位置界面应力的主要因素(或多个)被鉴定和最佳值建议。有限的数据,与在范围〜2%至管芯厚度的70%角部圆角的高度,建议对于大多数现场应用足够的可靠性。附加数据被要求进一步验证的结果。

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