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Effect of alloying W in Ni(5P) metallization of solder joints

机译:W合金化对焊点Ni(5P)金属化的影响

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As lead free solders are being implemented in commercial electronic goods, reliability of electroless Ni(P)/Pb-free solder joint has become an important issue because formation of Ni3P and Ni3SnP at solder/UBM interface increased the susceptibility to brittle cracking through these layers. In this report, composition of electroless Ni(P) under bump metallization(UBM) was modified by co-depositing W, and interfacial reactions between electroless Ni-5P-xW and Sn-3.5Ag solder were investigated using SEM and XRD. Results indicate that addition of W to the electroless Ni(5P) layer suppressed the formation of Ni3Sn4, increased the temperate of Ni3P formation, and increased the crystallinity of Ni-5P-xW film.
机译:随着无铅焊料在商用电子产品中的应用,无电Ni(P)/ Pb无铅焊点的可靠性已成为重要问题,因为形成了Ni 3 P和Ni 3 < / inf>焊料/ UBM界面处的SnP增加了穿过这些层的脆性裂纹的敏感性。在此报告中,通过共沉积W来修饰凸块金属化(UBM)下化学镀Ni(P)的成分,并使用SEM和XRD研究了化学镀Ni-5P-xW与Sn-3.5Ag焊料之间的界面反应。结果表明,向化学镀Ni(5P)层中添加W会抑制Ni 3 Sn 4 的形成,增加Ni 3 的温度P的形成,并增加了Ni-5P-xW膜的结晶度。

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