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Selective Growth of Diamond in Thermal Vias for GaN HEMTs

机译:GaN HEMT的热过孔中金刚石的选择性生长

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Abstract - GaN on SiC technology has offered tremendous benefits over existing GaAs-based RF technologies. The high breakdown voltage and current handling capability of GaN HEMTs enable a 10x increase in RF power over conventional GaAs- based devices for the same device size. These benefits translate to dramatically improved performance for military and commercial communications, radar and high-power RF systems. However, despite the high thermal conductivity materials and optimized epitaxial profiles already being used, additional improvement of MMIC performance is limited by thermal constraints. Substrate and near channel thermal resistance is a key thermal bottleneck limiting device compaction and junction temperature reduction. NGAS will report on revolutionary methods being developed to directly integrate high quality, high thermal conductivity diamond materials with more than 4x greater thermal conductivity over existing state-of-the-art GaN on SiC HEMT technology. Reducing temperature in the device channel and surrounding regions is critical for reliable operation, supporting additional device compaction and improving circuit performance.
机译:摘要-基于SiC的GaN技术比现有的基于GaAs的RF技术具有巨大的优势。 GaN HEMT的高击穿电压和电流处理能力使相同尺寸的传统GaAs器件的RF功率提高了10倍。这些优势可大大改善军事和商业通信,雷达和大功率RF系统的性能。但是,尽管已经使用了高导热率的材料和优化的外延轮廓,但是MMIC性能的进一步提高仍然受到热限制的限制。基板和近沟道热阻是限制器件压实和降低结温的关键热瓶颈。 NGAS将报告正在开发的革命性方法,这些方法将直接集成高质量,高导热率的金刚石材料,其导热率是现有SiC HEMT技术上最先进的GaN的4倍以上。降低设备通道和周围区域的温度对于可靠运行,支持额外的设备紧凑和改善电路性能至关重要。

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