A robust metric for measuring within-wafer uniformity

摘要

A robust metric for measuring within-wafer uniformity has beendeveloped and compared to the traditional SNR metric. The new statistic,referred to as the integration statistic, is based on the integration ofthe volumetric error between the target and the actual surfaces.Comparison with the traditional SNR uniformity metric indicates that theintegration statistic provides a more consistent estimate of theuniformity for different numbers of measurements and differentorientations of those measurements to the uniformity pattern