首页> 外文会议>Electronic Components and Technology Conference, 1991. Proceedings., 41st >Microstructural evolution in Sn/Pb solder and Pd/Ag thick filmconduction metallization
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Microstructural evolution in Sn/Pb solder and Pd/Ag thick filmconduction metallization

机译:Sn / Pb焊料和Pd / Ag厚膜的微观结构演变导电金属化

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Intermetallic compound formation between thick-film mixed bondedconductor and Sn/Pb solder is investigated. Microstructural evolution ofthe interfacial morphology, and elemental and phase distribution areprobed with the aid of electron microscopy and X-ray diffraction.Mechanical interlocking between the conductor and the substrate is shownto exist. Penetration of Bi element into the substrate is observed.Decrease in adhesion strength occurs when the sample is aged at130° C for a long period of time. Microstructural analysis revealsthe formation of the intermetallic compounds Pd3Sn, Pd2Sn, Pd3Sn2, PdSn, Pd3Pb, Ag5Sn, and Ag3Sn. The grain growth of the compounds afteraging is also observed. It is argued that conductor swelling caused bytin diffusion into the conductor film and volume change caused by theintermetallic formation are the major reasons for the degradation of thepeel strength
机译:厚膜混合键之间的金属间化合物形成 研究了导体和Sn / Pb焊料。的微观结构演变 界面形态,元素和相分布是 借助电子显微镜和X射线衍射进行探测。 显示了导体和基材之间的机械互锁 存在。观察到Bi元素渗透到基底中。 当样品在60°C下老化时,粘合强度会降低。 130°C长时间。微观结构分析显示 金属间化合物Pd 3 Sn,Pd 2的形成 Sn,Pd 3 Sn 2 ,PdSn,Pd 3 Pb,Ag 5 Sn和Ag 3 Sn。化合物的晶粒长大后 还观察到老化。有人认为导体膨胀是由 锡扩散到导体膜中并引起体积变化 金属间化合物的形成是导致合金降解的主要原因。 剥离强度

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