首页> 外文会议>Electronic Components and Technology Conference, 1991. Proceedings., 41st >Microstructural evolution in Sn/Pb solder and Pd/Ag thick film conduction metallization
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Microstructural evolution in Sn/Pb solder and Pd/Ag thick film conduction metallization

机译:Sn / Pb焊料和Pd / Ag厚膜导电金属化过程中的微观结构演变

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Intermetallic compound formation between thick-film mixed bonded conductor and Sn/Pb solder is investigated. Microstructural evolution of the interfacial morphology, and elemental and phase distribution are probed with the aid of electron microscopy and X-ray diffraction. Mechanical interlocking between the conductor and the substrate is shown to exist. Penetration of Bi element into the substrate is observed. Decrease in adhesion strength occurs when the sample is aged at 130 degrees C for a long period of time. Microstructural analysis reveals the formation of the intermetallic compounds Pd/sub 3/Sn, Pd/sub 2/Sn, Pd/sub 3/Sn/sub 2/, PdSn, Pd/sub 3/Pb, Ag/sub 5/Sn, and Ag/sub 3/Sn. The grain growth of the compounds after aging is also observed. It is argued that conductor swelling caused by tin diffusion into the conductor film and volume change caused by the intermetallic formation are the major reasons for the degradation of the peel strength.
机译:研究了厚膜混合键合导体与Sn / Pb焊料之间的金属间化合物形成。借助电子显微镜和X射线衍射探究了界面形态的微观结构演变以及元素和相的分布。导体与基板之间存在机械互锁。观察到Bi元素渗透到基底中。当样品在130摄氏度下长时间老化时,粘合强度会降低。微观结构分析揭示了金属间化合物Pd / sub 3 / Sn,Pd / sub 2 / Sn,Pd / sub 3 / Sn / sub 2 /,PdSn,Pd / sub 3 / Pb,Ag / sub 5 / Sn的形成,和Ag / sub 3 / Sn。还观察到老化后化合物的晶粒生长。认为由锡扩散到导体膜中引起的导体膨胀和由金属间化合物形成引起的体积变化是剥离强度降低的主要原因。

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