首页> 外文会议>Conference on Precision Electromagnetic Measurements >Fabrication of High-Current Multijunction Thermal Current Converters on Silicon Substrates by Wet Chemical Etching
【24h】

Fabrication of High-Current Multijunction Thermal Current Converters on Silicon Substrates by Wet Chemical Etching

机译:湿法化学刻蚀在硅衬底上制备大电流多结热流转换器

获取原文

摘要

This paper describes the design and fabrication of high-current multijunction thermal converters (HC-MJTCs) on Si substrates using wet chemical etching. The fabricated devices consist of a Si heat-reservoir under a heater. The low-resistive Cu80Au20 alloy heater is thermally isolated from the rest of the chip by a nitride-oxide membrane, which is produced by utilizing a simple potassium hydroxide (KOH) wet chemical etching. Measurements show that the devices exceed their rated current level up to 2 A without failure. Furthermore, the ac-dc differences of the devices were below $13 mu mathrm{A}/mathrm{A}$ over the input current levels at frequencies above 400 Hz, though large negative ac-dc differences were present below 100 Hz.
机译:本文介绍了使用湿法化学刻蚀在硅衬底上的大电流多结热转换器(HC-MJTC)的设计和制造。所制造的器件由位于加热器下的Si储热器组成。低阻铜 80 20 合金加热器通过氮氧化物膜与芯片的其余部分热隔离,该氮氧化物膜是利用简单的氢氧化钾(KOH)湿法化学蚀刻制成的。测量表明,这些设备在没有故障的情况下超过了其额定电流水平,最高可达2A。此外,设备的交流-直流差异低于 $ 13 \ \ mu \ mathrm { A} / \ mathrm {A} $ 在高于400 Hz的频率下的输入电流电平范围内,尽管在100 Hz以下存在较大的负交流-直流差异。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号